Synergy Between Plasma-Assisted ALD and Roll-to-Roll Atmospheric Pressure PE-CVD Processing of Moisture Barrier Films on Polymers
نویسندگان
چکیده
منابع مشابه
Roll to Roll Processing of Ultraconformable Conducting Polymer Nanosheets
Please note that technical editing may introduce minor changes to the text and/or graphics, which may alter content. The journal’s standard Terms & Conditions and the Ethical guidelines still apply. In no event shall the Royal Society of Chemistry be held responsible for any errors or omissions in this Accepted Manuscript or any consequences arising from the use of any information it contains. ...
متن کاملHigh-speed roll-to-roll manufacturing of graphene using a concentric tube CVD reactor
We present the design of a concentric tube (CT) reactor for roll-to-roll chemical vapor deposition (CVD) on flexible substrates, and its application to continuous production of graphene on copper foil. In the CTCVD reactor, the thin foil substrate is helically wrapped around the inner tube, and translates through the gap between the concentric tubes. We use a bench-scale prototype machine to sy...
متن کاملMoisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
A widely used application of the atomic layer deposition (ALD) and chemical vapour deposition (CVD) methods is the preparation of permeation barrier layers against water vapour. Especially in the field of organic electronics, these films are highly demanded as such devices are very sensitive to moisture and oxygen. In this work, multilayers of aluminium oxide (AlO x ) and plasma polymer (PP) we...
متن کاملRoll-to-roll production of 30-inch graphene films for transparent electrodes.
The outstanding electrical, mechanical and chemical properties of graphene make it attractive for applications in flexible electronics. However, efforts to make transparent conducting films from graphene have been hampered by the lack of efficient methods for the synthesis, transfer and doping of graphene at the scale and quality required for applications. Here, we report the roll-to-roll produ...
متن کاملAtmospheric Pressure Plasma CVD of Amorphous Hydrogenated Silicon Carbonitride (aSiCN:H) Films Using Triethylsilane and Nitrogen
Amorphous hydrogenated silicon carbonitride (a-SiCN:H) thin films are synthesized by atmospheric pressure plasma enhanced chemical vapor (AP-PECVD) deposition using the Surfx Atomflow 250D APPJ source with triethylsilane (HSiEt3, TES) and nitrogen as the precursor and the reactive gases, respectively. The effect of the substrate temperature (Ts) on the growth characteristics and the properties ...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: Plasma Processes and Polymers
سال: 2015
ISSN: 1612-8850
DOI: 10.1002/ppap.201500096